Research team develops directlaserwriting system for high-resolution, high-efficiency nanofabrication SPIEtweets
Multifocus parallel scanning and the PPI technique can enable potential breakthroughs in DLW optical fabrication. Herein, we proposed a two-focus parallel scanning strategy with minimal hardware updates for system stability. Furthermore, the identical on–off control of each focus verifies the possibility of rapid parallel lithography of nonperiodic patterns and structures, increasing the flexibility of DLW.
For a DLW system, reducing the time cost required to fabricate large-scale structures or patterns is a major challenge. Parallel scanning is a feasible solution to this problem. However, another important issue is related to the stitching process, particularly for systems using galvanometer scanners. In the proposed system, the separation distance between the two spots can be controlled by adjusting the tilt parameter following the Zernike polynomials.
The proposed system can provide a sub-50-nm feature size in direct-writing lithography and extend the potential application range of DLW optical fabrication. In particular, for the fabrication of certain 3D structures with dimensions of several hundred nanometers, traditional 2PP-DLW with a feature size of more than 100 nm may encounter sampling and subdivision issues owing to the relatively large pixel volumes, which may lead to increased roughness of the fabricated structures.
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