Hafnium oxide-based ferroelectric materials are promising candidates for next-generation nanoscale devices due to their integration into silicon electronics.
, researchers from the Institute of Microelectronics of the Chinese Academy of Sciences and the Institute of Physics of CAS made the discovery of a stable rhombohedral ferroelectric Hf.
, researchers from the Institute of Microelectronics of the Chinese Academy of Sciences and the Institute of Physics of CAS made the discovery of a stable rhombohedral ferroelectric HfDeutschland Neuesten Nachrichten, Deutschland Schlagzeilen
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